发明名称 Method of producing a sputtering target
摘要 A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom. %) of alpha, beta, gamma and delta thereof being in the relationship of 0.5<=alpha<8, 5 <=beta<=23, 17 <=gamma<=38, 32<=delta<=73, alpha<=beta, and alpha+beta+gamma+delta=100, and a method of producing the above sputtering target is provided. An optical recording medium includes a recording layer containing a phase-change recording material which includes as constituent elements Ag, In, Te and Sb with the respective atomic percents of alpha, beta, gamma and delta thereof being in the relationship of 1<=alpha<6, 7<=beta<=20, 20<=gamma<=35, 35<=delta<=70, and alpha+beta+gamma+delta=100, and is capable of recording and erasing information by utilizing the phase change of the recording material in the recording layer. A method of forming the above recording layer for the optical recording medium is also provided. In addition, there is provided an optical recording method using the above-mentioned phase-change optical recording medium.
申请公布号 US2004058542(A1) 申请公布日期 2004.03.25
申请号 US20030672353 申请日期 2003.09.25
申请人 IDE YUKIO;IWASAKI HIROKO;KAGEYAMA YOSHIYUKI;KANEKO YUJIRO;YAMADA KATSUYUKI;SHINOTSUKA MICHIAKI;HARIGAYA MAKOTO;DEGUCHI HIROSHI 发明人 IDE YUKIO;IWASAKI HIROKO;KAGEYAMA YOSHIYUKI;KANEKO YUJIRO;YAMADA KATSUYUKI;SHINOTSUKA MICHIAKI;HARIGAYA MAKOTO;DEGUCHI HIROSHI
分类号 C23C14/06;C23C14/34;G11B7/0045;G11B7/24;G11B7/243;G11B7/257;G11B7/258;G11B7/26;(IPC1-7):H01L21/302;H01L21/461 主分类号 C23C14/06
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