| 摘要 |
PROBLEM TO BE SOLVED: To provide a registration measuring method which prevents the lateral or vertical asymmetry of a pattern edge due to a difference in the pathway of light in a lens of an aligner by using marks formed by the same minimum rule as in a main circuit pattern which requires a most strict registration for registration measurement marks, and which can correctly measure a quantity of slippage between a main circuit pattern of a first pattern layer and that of a second pattern layer, by directly measuring pattern edges of registration measurement marks formed simultaneously by the same minimum rule as in the main circuit pattern formed in the first pattern layer and of those formed simultaneously by the same minimum rule as in the main circuit pattern formed in the second pattern layer. SOLUTION: The registration measuring method uses marks formed simultaneously by the same minimum rule as in the main circuit patterns as the registration measuring marks, and can directly measure the pattern edges of these registration measuring marks. Consequently, a correct quantity of slippage between the main circuit patterns formed in various pattern layers can be obtained. COPYRIGHT: (C)2004,JPO |
