发明名称 Beam homogenizer and laser irradiation apparatus and method of manufacturing semiconductor device
摘要 The inhomogeneous energy distribution at the beam spot on the irradiated surface is caused by a structural problem and processing accuracy of the cylindrical lens array forming an optical system. According to the present invention, in the optical system for forming a rectangular beam spot, an optical system for homogenizing the energy distribution of the shorter side direction of a rectangular beam spot of a laser light on an irradiated surface is replaced with a light guide. The light guide is a circuit that can confine emitted beams in a certain region and guide and transmit its energy flow in parallel with the axis of a path thereof.
申请公布号 US2004058553(A1) 申请公布日期 2004.03.25
申请号 US20030664916 申请日期 2003.09.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD 发明人 TANAKA KOICHIRO
分类号 H01L21/324;B23K26/06;B23K26/073;G02B27/09;(IPC1-7):H01L21/302;H01L21/461 主分类号 H01L21/324
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