发明名称 |
Beam homogenizer and laser irradiation apparatus and method of manufacturing semiconductor device |
摘要 |
The inhomogeneous energy distribution at the beam spot on the irradiated surface is caused by a structural problem and processing accuracy of the cylindrical lens array forming an optical system. According to the present invention, in the optical system for forming a rectangular beam spot, an optical system for homogenizing the energy distribution of the shorter side direction of a rectangular beam spot of a laser light on an irradiated surface is replaced with a light guide. The light guide is a circuit that can confine emitted beams in a certain region and guide and transmit its energy flow in parallel with the axis of a path thereof.
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申请公布号 |
US2004058553(A1) |
申请公布日期 |
2004.03.25 |
申请号 |
US20030664916 |
申请日期 |
2003.09.22 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD |
发明人 |
TANAKA KOICHIRO |
分类号 |
H01L21/324;B23K26/06;B23K26/073;G02B27/09;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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