| 摘要 |
PURPOSE: A method for fabricating an array substrate for a liquid crystal display is provided to promote process efficiency by reducing the number of mask used in a process, consequently its fabrication cost can be reduced by the method. CONSTITUTION: According to the method, a gate line is formed which includes a gate electrode(210) and a gate pad and is located along the first direction by the first mask process, after forming the first metal material on a substrate. A data line including a data pad, an ohmic contact layer(225), a source electrode(233) and a drain electrode(236) are formed and are located along the second direction by the second mask process, after forming the first insulation film, an amorphous silicon layer, an impurity amorphous silicon layer and the second metal film on the substrate. A channel area is formed by etching the amorphous silicon between the source electrode and the drain electrode. A protection layer and a conductive material layer are formed by depositing the second insulation material and a transparent conductive material on the substrate. A pixel electrode(280) and a gate pad electrode and a data pad electrode are formed by patterning the transparent conductive material by the third mask process. A hole penetrating the protection layer is formed by irradiating a laser to each part of the pixel electrode, and the pixel electrode is contacted with the drain electrode and a storage capacitor electrode by melting the pixel electrode to flow down to the hole. Then, the gate pad and the gate electrode are contacted with the data pad. |
