发明名称 |
Process for manufacturing and applying an anti-scatter grid or collimator on an X-ray or gamma detector |
摘要 |
A process for producing and setting up a scattered radiation screen or collimator on an X-ray or gamma ray detector comprises forming a matrix of detector elements comprising sensitive regions (16a) and less sensitive intermediate regions (16b) on a structure with through channels and intermediate walls (6a) and an absorbing coating (14). Independent claims are also included for gamma and X-ray detectors for the above. |
申请公布号 |
EP1400984(A2) |
申请公布日期 |
2004.03.24 |
申请号 |
EP20030019198 |
申请日期 |
2003.08.25 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT |
发明人 |
HOHEISEL, MARTIN, DR.;SCHAEFER, MARTIN;SKLEBITZ, HARTMUT |
分类号 |
G01T1/20;G21K1/02;G21K1/10 |
主分类号 |
G01T1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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