发明名称 Process for manufacturing and applying an anti-scatter grid or collimator on an X-ray or gamma detector
摘要 A process for producing and setting up a scattered radiation screen or collimator on an X-ray or gamma ray detector comprises forming a matrix of detector elements comprising sensitive regions (16a) and less sensitive intermediate regions (16b) on a structure with through channels and intermediate walls (6a) and an absorbing coating (14). Independent claims are also included for gamma and X-ray detectors for the above.
申请公布号 EP1400984(A2) 申请公布日期 2004.03.24
申请号 EP20030019198 申请日期 2003.08.25
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 HOHEISEL, MARTIN, DR.;SCHAEFER, MARTIN;SKLEBITZ, HARTMUT
分类号 G01T1/20;G21K1/02;G21K1/10 主分类号 G01T1/20
代理机构 代理人
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