发明名称 METHOD FOR FORMING BUMP ON SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER HAVING BUMP FORMED THEREBY
摘要 PURPOSE: A method for forming a bump on a semiconductor wafer and a semiconductor wafer having a bump formed thereby are provided to form the bump on the semiconductor wafer without lowering the stability of bump forming solution. CONSTITUTION: A passivation layer(22) is formed on the remaining part except for the center part of an electrode pad(21) of a semiconductor wafer(20). A bump forming solution(23A) for forming a bump is uniformly coated on the surface of the electrode pad(21). The bump is formed on the surface of the electrode pad(21) by heating the bump forming solution. The remaining bump forming solution except for the bump is removed from the semiconductor wafer(20).
申请公布号 KR20040025429(A) 申请公布日期 2004.03.24
申请号 KR20020057392 申请日期 2002.09.19
申请人 SAMSUNG TECHWIN CO., LTD. 发明人 PARK, JONG HAN
分类号 H01L21/60 主分类号 H01L21/60
代理机构 代理人
主权项
地址
您可能感兴趣的专利