发明名称 EXPOSURE SYSTEM INCLUDING MICRO MIRROR ARRAY AND EXPOSURE METHOD USING THE SAME
摘要 PURPOSE: An exposure system including a micro mirror array and an exposure method using the same are provided to obtain the high resolution and the optimum DOF by using only the micro mirror array without forming an aperture having a particular shape. CONSTITUTION: An exposure system including a micro mirror array includes a reflective mirror unit(330) having a micro mirror array(332). The micro mirror array(332) is used for reflecting the incident light to the aperture-shaped light. The exposure system including the micro mirror array further includes a driving unit(333). The driving unit(333) is installed at the reflective mirror unit(330). The driving unit(333) is used for controlling an angle of a mirror of the micro mirror array(332). The exposure system including the micro mirror array further includes a control unit(334). The control unit(334) controls the operation of the driving unit in order to define a shape of aperture.
申请公布号 KR20040025487(A) 申请公布日期 2004.03.24
申请号 KR20020057465 申请日期 2002.09.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JIN, SEON YONG;KIM, YONG HUN;YANG, SEUNG HUN
分类号 H01L21/027;G03B27/54;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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