| 摘要 |
PURPOSE: A CVD(Chemical Vapor Deposition) apparatus using a disc-type valve is provided to reduce the amount of powers accumulated on the disc-shaped valve by preventing the generation of eddy current. CONSTITUTION: A CVD apparatus using a disc-type valve includes a process chamber, the first exhaust tube, an accumulator, the second exhaust tube, a disc-type valve, and a scrubber. The first exhaust tube is connected to the process chamber. The accumulator is connected to the first exhaust tube. The second exhaust tube is connected to the accumulator. The disc-type valve is installed in the inside of the second exhaust tube. The disc-type valve is formed with a shielding plate(152) and a couple of discs(154,156). The scrubber is connected to the second exhaust tube. The discs(154,156) are formed on a front side and a rear side of the shielding plate(152).
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