发明名称 SILICON SINGLE CRYSTAL AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a silicon single crystal and a method for producing the same in which even a large-diameter silicon single crystal can be separated without dislocation without harmful effect on crystal characteristics in a short time. SOLUTION: The silicon single crystal produced by Czochralski method has a tail end surface in which an annular recessed part is formed along the periphery thereof; a disk raised section is concentrically formed inside the annular recessed part; and a protruding liquid droplet section is formed during separation facing downward at the center of the disk raised section. The silicon single crystal also has an inclined portion at the periphery of the tail end surface in which an annular recessed part is formed in the inner side thereof; a disk raised section is concentrically formed inside the annular recessed part; and a protruding liquid droplet section is formed during separation facing downward at the center of the disk raised section. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004083389(A) 申请公布日期 2004.03.18
申请号 JP20030059314 申请日期 2003.03.06
申请人 TOSHIBA CERAMICS CO LTD 发明人 NAKAO ATSUSHI;NISHIBORI FUMITAKA;IKEUCHI YASUKI;KAJIMA KAZUHIKO
分类号 C30B29/06;C30B15/20;(IPC1-7):C30B29/06 主分类号 C30B29/06
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