| 发明名称 |
CLEANING COMPOSITIONS FOR MICROELECTRONIC SUBSTRATES |
| 摘要 |
Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k dielectrics and copper or aluminum metallizations contain a polar organic solvent selected from amides, sulfones, sulfolenes, selenones and saturated alcohols and a strong alkaline base. |
| 申请公布号 |
WO03104901(A3) |
申请公布日期 |
2004.03.18 |
| 申请号 |
WO2003US16829 |
申请日期 |
2003.05.27 |
| 申请人 |
MALLINCKRODT BAKER INC.;HSU, CHIEN-PIN, SHERMAN |
发明人 |
HSU, CHIEN-PIN, SHERMAN |
| 分类号 |
C11D1/00;C11D7/50;C23G1/00;C23G1/06;G03F7/42;H01L21/027;H01L21/304;H05K3/26 |
主分类号 |
C11D1/00 |
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