发明名称 METHOD FOR FORMING METAL LAYER PATTERN
摘要 PURPOSE: A method for forming a metal layer pattern is provided to eliminate the need to increase the temperature of a substrate by supporting a metal layer by a photoresist pattern when the metal layer is formed. CONSTITUTION: The first photoresist pattern(121) is formed on a substrate(110). The second photoresist pattern(122) is formed on the first pattern. A metal seed layer(130) of a metal material for forming a seed layer is formed on the substrate in which the first and second patterns are sequentially formed. The second pattern is dissolved by using an organic solvent to separate the second pattern and the metal material for forming the seed layer formed on the second pattern. A metal layer made of a metal material for forming a layer is formed on the substrate including the metal seed layer. The first pattern is dissolved by using an organic solvent to separate the first pattern and the metal material for forming the layer formed on the first pattern.
申请公布号 KR20040022921(A) 申请公布日期 2004.03.18
申请号 KR20020054514 申请日期 2002.09.10
申请人 SAMSUNG SDI CO., LTD. 发明人 CHOI, GWI SEOK;JU, GYU NAM;PARK, HYEON GI
分类号 H01L21/28;(IPC1-7):H01L21/28 主分类号 H01L21/28
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