发明名称 Sputtering target, method of making same, and high-melting metal powder material
摘要 There is provided a method of making a high-melting metal powder which has high purity and excellent formability and, particularly, of a metal powder of spherical particles made of Ta, Ru, etc. having a higher melting point than iron. There is also provided a target of high-melting metal or its alloy, which is made by the sintering under pressure of these powders and which has high purity and a low oxygen concentration and shows high density and a fine and uniform structure. A powder metal material mainly composed of a high-melting metal material is introduced into a thermal plasma into which hydrogen gas has been introduced, thereby to accomplish refining and spheroidizing. Further, an obtained powder is pressed under pressure by hot isostatic pressing, etc.
申请公布号 EP1066899(A3) 申请公布日期 2004.03.17
申请号 EP20000114459 申请日期 2000.07.05
申请人 HITACHI METALS, LTD. 发明人 HAN, GANG;MURATA, HIDEO;NAKAMURA, HIDEKI
分类号 B22F9/14;B22F1/00;B22F3/105;B22F3/14;B22F3/15;C22C1/04;C23C14/34 主分类号 B22F9/14
代理机构 代理人
主权项
地址