发明名称 Reflective spectral filtering of high power extreme ultra-violet radiation
摘要 In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.
申请公布号 US6707602(B2) 申请公布日期 2004.03.16
申请号 US20030408075 申请日期 2003.04.03
申请人 INTEE CORPORATION 发明人 GOLDSTEIN MICHAEL
分类号 G03F7/20;(IPC1-7):G02B5/20 主分类号 G03F7/20
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