发明名称 Nonvolatile semiconductor storage device
摘要 When data is read from one of the memory elements in a memory cell [i] in a reverse read mode, a word line WL1 is set at a supply voltage Vdd, a control gate CG [i+1] is set at 1.5V, and a control gate CG [i] is set at an override voltage (for example, 3V). When a bit line BL [I+1] is 0V and a bit line BL [i] is connected to a sense amplifier, the gate voltage BS0 of a bit line selection transistor located midway of the bit line BL [i] is set at a high voltage (for example, 4.5V), in order to ensure current which flows through the bit line BL [i] connected to the drain of the memory cell [i]. Since the voltage of the bit line BL [i+1] connected to the source of the memory cell [i] becomes a value close to 0V (on the order of several tens to hundred mV), the back gate of a bit line selection transistor exerts little influence, and hence, the gate voltage BS1 of this bit line selection transistor is set at the supply voltage Vdd.
申请公布号 US6707720(B2) 申请公布日期 2004.03.16
申请号 US20020157896 申请日期 2002.05.31
申请人 SEIKO EPSON CORPORATION 发明人 KAMEI TERUHIKO;KANAI MASAHIRO
分类号 G11C16/06;G11C7/12;G11C7/18;G11C16/04;(IPC1-7):G11C16/04 主分类号 G11C16/06
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