APPARATUS FOR DRYING SUBSTRATE

摘要

PURPOSE: An apparatus for drying a substrate is provided to form a stable isopropyl alcohol vapor region inside a receptacle and uniformly perform a stable dry process on semiconductor substrates by making clean air from being intercepted by a cover such that the clean air is induced to the inside of the receptacle through an opening of the receptacle. CONSTITUTION: The opening(202a) is formed in the upper portion of the receptacle(202). Isopropyl alcohol vapor(10) for drying a plurality of substrates(W) is received in the receptacle. A support unit(212) vertically supports each of the plurality of substrates in the receptacle and horizontally supports the plurality of substrates in parallel with each other, extending to a portion over the receptacle through the opening of the receptacle. The cover(228) intercepts the clean air that is directly induced from an air cleaner(260) disposed in a portion over the receptacle to the inside of the receptacle through the opening of the receptacle.