RADIO FREQUENCY POWER PURGE METHOD OF PLASMA CHAMBER

摘要

PURPOSE: A radio frequency(RF) power purge method of a plasma chamber is provided to minimize damage to a wafer by preventing the charge particles from losing their charges and being dropped to the wafer when RF power turns off. CONSTITUTION: The plasma chamber is driven by RF power. An RF power purge process is performed when the RF power turns off so that the charge particles are pumped out while their charges are not lost. The RF power purge process is rapidly performed while a throttle valve for controlling the pressure inside the plasma chamber is maximumly open.