METHOD FOR MANUFACTURING ALUMINA FILM MAINLY CONSISTING OF ALPHA CRYSTALLINE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently depositing an alumina film consisting mainly ofα-crystalline structure at a relatively low temperature range when depositing the alumina film on a substrate by sputtering an aluminum metal target in an atmosphere containing oxidizing gas. SOLUTION: The film deposition thickness for each operation is set to be≤5 nm, and alumina films are intermittently deposited on a substrate a plurality of times when depositing alumina films on the substrate by sputtering an aluminum metal target in an atmosphere containing oxidizing gas. COPYRIGHT: (C)2004,JPO