MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR SILICON OXIDE-BASED CERAMIC FILM BY VAPOR PHASE SYNTHESIS METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a silicon oxide-based ceramic film having pores possessing a uniform pore size at a low cost and a manufacturing apparatus capable of continuously synthesizing such film. SOLUTION: In the method for manufacturing the silicon oxide-based ceramic film on the surface of a porous support from a silica source and an aqueous alkaline solution (or an aqueous alkaline solution of an alumina source), the method and apparatus for depositing the silicon oxide-based ceramic film by a vapor phase reaction on the surface of the porous support 4 without mixing the silica source A and the aqueous alkaline solution (or the aqueous alkaline solution of an alumina source B) in a hermetic vessel 1 are obtained. COPYRIGHT: (C)2004,JPO