| 摘要 |
PROBLEM TO BE SOLVED: To provide a phosphor layer manufacturing method for preventing the deterioration in information in reading radioactive ray image information from a phosphor sheet, uniformizing the thickness in a phosphor layer, further actually, having the thickness of about 500μm in an ordinary case and even 1,000μm in a thick case, and realizing a superior optical characteristic. SOLUTION: The phosphor layer manufacturing method is characterized by polishing a surface of the phosphor layer after forming a film by forming the phosphor layer as the film on a sheet-like base board in a vacuum chamber. The surface of the phosphor layer is desirably polished by relatively moving a polishing material and the base board in a state of positioning the polishing material at a prescribed interval between the surface and a prescribed reference surface. COPYRIGHT: (C)2004,JPO
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