| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve conventional problems such that when the length 19 of figure groups 15, 17 is not consistent with the lateral dimension of a ring-type region 11 or when the length 20 of figure groups 16, 18 is not consistent with the longitudinal dimension of the ring-type region 11, the lateral dimension 12 or longitudinal dimension 13 of the ring-type region 11 on a silicon wafer is not consistent with the aimed dimension. <P>SOLUTION: The layout apparatus for a pattern figure functions to layout basic figures 44 in the number determined by a determining part 34 of the layout number in a ring-type region 41 from the top of the ring-type region 41 as the starting point with a designated layout spacing 53. <P>COPYRIGHT: (C)2004,JPO</p> |
