发明名称 Apparatus for drying a substrate using an isopropyl alcohol vapor
摘要 An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.
申请公布号 US2004045188(A1) 申请公布日期 2004.03.11
申请号 US20030635458 申请日期 2003.08.07
申请人 KO YONG-KYUN;RYU JAE-JUN;YI HUN-JUNG;JUN PIL-KWON 发明人 KO YONG-KYUN;RYU JAE-JUN;YI HUN-JUNG;JUN PIL-KWON
分类号 H01L21/304;H01L21/00;(IPC1-7):F26B9/00 主分类号 H01L21/304
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