| 发明名称 |
An alignment tool, a lithographic apparatus, an alignment method and a device manufacturing method |
| 摘要 |
<p>An extra optical element is placed in the alignment beam during alignment. The optical element serves to focus the alignment beam onto the substrate alignment mark when it is at a different focal length from the front surface of the substrate.</p> |
| 申请公布号 |
EP1396761(A2) |
申请公布日期 |
2004.03.10 |
| 申请号 |
EP20030255323 |
申请日期 |
2003.08.27 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOF, JOERI;BIJNEN, FRANSISCUS GODEFRIDUS CASPER;VAN BUEL, HENRICUS WILHELMUS MARIA;GUI, CHENG-QUN |
| 分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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