发明名称 Semiconductor memory
摘要 The semiconductor memory of this invention includes an MFMIS transistor including a field effect transistor (10) and a ferroelectric capacitor (20) formed above the field effect transistor. The semiconductor memory has a characteristic that a value of ( sigma - p) is substantially not changed with time in a relational expression, V = (d/ epsilon 0) x ( sigma -p), which holds among a potential difference V between an upper electrode and a lower electrode, a surface density of charge sigma of a ferroelectric film, polarization charge p of the ferroelectric film, a thickness d of the ferroelectric film and a dielectric constant epsilon 0 of vacuum when a data is written in the MFMIS transistor and the ferroelectric film is in a polarized state. <IMAGE>
申请公布号 EP1164642(A3) 申请公布日期 2004.03.10
申请号 EP20010114227 申请日期 2001.06.12
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 SHIMADA, YASHUHIRO;KATO, YOSHIHISA
分类号 H01L21/8247;H01L21/336;H01L21/8246;H01L27/105;H01L27/115;H01L29/51;H01L29/78;H01L29/788;H01L29/792;H01L51/05;(IPC1-7):H01L29/78 主分类号 H01L21/8247
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