发明名称 |
Wafer chuck for producing an inert gas blanket and method for using |
摘要 |
A wafer chuck for use in a semiconductor process chamber capable of producing an inert gas blanket positioned on the chuck from residual chemical vapor in the chamber is disclosed. A plurality of mounting pins for supporting a wafer is further provided in the upper surface for forming an inert gas into a cavity formed between the wafer and the upper surface of the chuck. A plurality of apertures in a sidewall of the body portion for flowing an inert gas into the lower chamber forming an inert gas blanket blocking a passageway between the upper and lower chambers, thus preventing the wafer from damage by residual chemical vapor in the lower chamber.
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申请公布号 |
US6702900(B2) |
申请公布日期 |
2004.03.09 |
申请号 |
US20010815216 |
申请日期 |
2001.03.22 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
YEH SU-YU;YANG HUAI-TEI;PAN CHENG-YANG;LAI JUN-YANG |
分类号 |
H01L21/00;(IPC1-7):C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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