| 摘要 |
To correct aberration generated in the optical system of an image pickup device on a photoelectric conversion device and correct light amount nonuniformity generated in the optical system, as the characteristic feature of the photoelectric conversion device, the aperture positions where photoelectric conversion is performed are different from each other in a photoelectric conversion area. The aperture ratio of the aperture region where photoelectric conversion is performed is changed in units of arrangement positions. The pitch of pixels is shifted to shift the position of the aperture region, or the pattern of a light-shielding layer is shifted stepwise to shift the position of the aperture region. Alternatively, the pitch of a pixel string in the horizontal or vertical direction is changed, and the pattern of the light-shielding layer is changed stepwise to shift the aperture position in both the horizontal and vertical directions in a plane.
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