发明名称 SOI semiconductor integrated circuit for eliminating floating body effects in SOI MOSFETs and method of fabricating the same
摘要 A silicon-on-insulator (SOI) integrated circuit and a method of fabricating the SOI integrated circuit are provided. At least one isolated transistor active region and a body line are formed on an SOI substrate. The transistor active region and the body line are surrounded by an isolation layer which is in contact with a buried insulating layer of the SOI substrate. A portion of the sidewall of the transistor active region is extended to the body line. Thus, the transistor active region is electrically connected to the body line through a body extension. The body extension is covered with a body insulating layer. An insulated gate pattern is formed over the transistor active region, and one end of the gate pattern is overlapped with the body insulating layer.
申请公布号 US6703280(B2) 申请公布日期 2004.03.09
申请号 US20020330404 申请日期 2002.12.27
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM YOUNG-WUG;KIM BYUNG-SUN;KANG HEE-SUNG;KO YOUNG-GUN;PARK SUNG-BAE;KIM MIN-SU;KIM KWANG-IL
分类号 H01L29/786;(IPC1-7):H01L21/824 主分类号 H01L29/786
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