发明名称 |
SEMICONDUCTOR FILM AND ITS FORMING PROCESS, SEMICONDUCTOR DEVICE AND DISPLAY EMPLOYING THAT SEMICONDUCTOR FILM |
摘要 |
PROBLEM TO BE SOLVED: To form a semiconductor film of such a crystallinity as crystal faces parallel with the film face are oriented to ä100} face. SOLUTION: When energy having a specified energy density is imparted to a silicon film, a crystal silicon where a substantial ä100} face is oriented preferentially in parallel with the film face is generated. A catalytic substance is then introduced to the region of the silicon film where the crystal silicon is generated using the crystal silicon as a crystal seed and crystal is grown in the lateral direction thus obtaining a crystalline silicon film in which the entire semiconductor film is oriented preferentially to substantial ä100} face in parallel with the film face. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004071832(A) |
申请公布日期 |
2004.03.04 |
申请号 |
JP20020229061 |
申请日期 |
2002.08.06 |
申请人 |
SHARP CORP |
发明人 |
MIYAJIMA TOSHIAKI;NAKAMURA YOSHINOBU;KANEKO TOSHIHIRO |
分类号 |
G02F1/1368;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20;G02F1/136 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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