发明名称 |
Considering mask writer properties during the optical proximity correction process |
摘要 |
One embodiment of the invention provides a system that performs optical proximity correction in a manner that accounts for properties of a mask writer that generates a mask used in printing an integrated circuit. During operation, the system receives an input layout for the integrated circuit. The system also receives a set of mask writer properties that specify how the mask writer prints features. Next, the system performs an optical proximity correction process on the input layout to produce an output layout that includes a set of optical proximity corrections. This optical proximity correction process accounts for the set of mask writer properties in generating the set of optical proximity corrections, so that the mask writer can accurately produce the set of optical proximity corrections.
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申请公布号 |
US2004044984(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
US20020232130 |
申请日期 |
2002.08.30 |
申请人 |
NUMERICAL TECHNOLOGIES, INC. |
发明人 |
KEOGAN DANNY;PIERRAT CHRISTOPHE |
分类号 |
G03F1/14;G06F17/50;(IPC1-7):G06F17/50 |
主分类号 |
G03F1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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