| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a means to deposit a film having an arbitrary intermediate refractive index between that of a material of high refractive index and that of a material of low refractive index, and more specifically, a target to deposit an optical thin film having a desired refractive index by a sputtering method. <P>SOLUTION: The reactive sputtering target has a main component consisting of one-element simple substance or a compound thereof. The principal component is obtained by uniformly mixing and solidifying the component consisting of another element simple substance of different melting point or a compound thereof with the principal component at a predetermined mixing ratio. Preferably, the principal component element of the target is Si, and another component element is at least one kind of Ta, Nb, Zr, Ti and Al. <P>COPYRIGHT: (C)2004,JPO |
