IMPRINT LITHOGRAPHY PROCESSES AND SYSTEMS

摘要

An imprint lithography process using a template (12) which includes a lower surface (566) with first recesses (562) having a first height (h1) and second recesses (564) having a second height (h2) greater than first height (h1) of first recesses, wherein curable liquid (40) is disposed in superimposition with the portions of template having recesses therein that are no greater than first height (h1) and is absent with respect to portions of template (12) having second height (h2).