| 摘要 |
PURPOSE: To produce a material, having antimicrobial and antifungal properties imparted thereto and capable of effectively using an antimicrobial and antifungal agent without waste and need for the use of an inorganic metallic agent as the antimicrobial and antifungal agent by using the antimicrobial and antifungal agent, causing slight toxicity and malodor and hardly decomposable with light. CONSTITUTION: This material having antimicrobial and antifungal properties imparted thereto is obtained by initially coating the surface of a substrate film 2 with a coating agent 10 prepared by mixing a radiation curing resin 12 and 3-iodo-2-propynylbutyl carbamate as an antimicrobial and antifungal agent 16, then irradiating the surface of the coating agent 10 applied to the substrate film 2 with electron beams, producing radicals, thereby initiating the polymerizing reaction or crosslinking reaction of a monomer and/or an oligomer, forming a polymer and providing a cured film of the coating agent 10. The antimicrobial and antifungal agent 16 in an amount of 500ppm is added to the radiation curing resin. Thereby, the antimicrobial and antifungal properties are imparted to the substrate film 2. |
