发明名称 Non-volatile semiconductor memory device having an increased access speed while maintaining the production yield
摘要 Bit lines formed from a first metal wiring layer and bit lines formed from a second metal wiring layer are provided as bit lines that intersect with word lines. The bit lines are formed from metal wiring layers and are divided into two layers so that the pitch of the bit lines can be widened. Thereby, a non-volatile semiconductor memory device having an increased access speed while maintaining production yield can be implemented.
申请公布号 US2004037113(A1) 申请公布日期 2004.02.26
申请号 US20020334010 申请日期 2002.12.31
申请人 OOISHI TSUKASA 发明人 OOISHI TSUKASA
分类号 G11C16/06;G11C7/18;G11C16/04;H01L21/8246;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C16/04 主分类号 G11C16/06
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