发明名称 ETCHING PROCESS FOR MICROMACHINING CRYSTALLINE MATERIALS AND DEVICES FABRICATED THEREBY
摘要 The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographaich planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the oreintation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop it with an etch-stop layer.
申请公布号 KR20040017339(A) 申请公布日期 2004.02.26
申请号 KR20047000893 申请日期 2002.07.19
申请人 发明人
分类号 B81B1/00;H01L21/302;B81C1/00;G02B6/12;G02B6/36;G02B6/42;H01L21/306 主分类号 B81B1/00
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