发明名称 COATING DEVICE AND COATING METHOD
摘要 A coating solution is supplied to a substrate as an experimental substrate that is the same type as a product substrate while the experimental substrate is being scanned by a nozzle so as to form a line of the coating solution. The line of the coating solution is photographed by for example a CCD camera so as to obtain a contact angle of the coating solution. Using a geometric model according to the contact angle, relation data of a discharge flow amount of the coating solution nozzle at a scanning speed for a real coating process for the product substrate and an allowable range of a pitch is obtained. Relation data of the discharge flow amount of the coating solution nozzle and the pitch is pre-created for each of a plurality of targets of the film thickness. According to the relation data, the pitch is decided.
申请公布号 KR20040017271(A) 申请公布日期 2004.02.26
申请号 KR20047000004 申请日期 2002.07.01
申请人 发明人
分类号 H01L21/20;B05C5/02;B05D1/00;G03F7/16;H01L21/00 主分类号 H01L21/20
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