| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for forming a membrane capable of forming a silica-based membrane having low dielectric constant and high elastic modulus as an interlaminar electrical insulation membrane material for semiconductor devices or the like. SOLUTION: The composition for forming a membrane comprises a polysiloxane which is obtained by hydrolyzing (A) at least one silane compound selected from the group consisting of a compound of the general formula(1):R<SB>x</SB>Si(OR<SP>1</SP>)<SB>4-x</SB>, a compound of the general formula(2):Si(OR<SP>2</SP>)<SB>4</SB>and a compound of the general formula(3):R<SP>3</SP><SB>y</SB>(R<SP>4</SP>O)<SB>3-y</SB>Si-(R<SP>7</SP>)<SB>d</SB>-Si(OR<SP>5</SP>)<SB>3-z</SB>R<SP>6</SP><SB>z</SB>in the presence of (B) a basic compound, (C) water and (D) a secondary or tertiary alcohol followed by carrying out a condensation reaction. In the general formulae(1), (2) and (3), R is H, F or a monovalent organic group, R<SP>1</SP>to R<SP>6</SP>are each a monovalent organic group, and R<SP>7</SP>is O, a phenylene group or the group:-(CH<SB>2</SB>)<SB>n</SB>-. COPYRIGHT: (C)2004,JPO
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