| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus and a semiconductor device, whose costs are lower than those of conventional ones, by keeping their producing efficiencies high, and by suppressing the aligning discrepancy between the wafer and the mask pattern of the apparatus. <P>SOLUTION: In a thermostatic chamber 10, there are provided a mask stage 12, a projecting optical system 13, an alignment system 14, a wafer stage 15 for holding thereon a semiconductor substrate Waf, and an automatically focusing mechanism 16, and together with them, an illuminating system 11 is provided. In the mask stage 12, an LCD panel mask 17, having the equivalent function to a reticle pattern is provided. By a CAD system 18, comprising a CAD tool and an operation controlling portion utilizing a mask-pattern data base, liquid-crystal driving and controlling signals are obtained so as to control the alignment of liquid-crystal molecules in the respective segments of a panel displaying portion 171 and to form a mask pattern for passing/intercepting exposure lights. Thereby, an exposure processing is performed to a resist applied to the semiconductor substrate Waf. <P>COPYRIGHT: (C)2004,JPO</p> |
