Radiation curable compositions

摘要

A photo-resist composition is disclosed that is a partial esterification product of a styrene maleic anhydride copolymer with (meth)acrylate and hydroxyl containing side chains. An amide containing (meth)acrylate is optionally present. These compositions exhibit a good balance between UV cure rate, tack free properties, and dissolution of uncured composition by dilute alkaline solution.