发明名称 Non-volatile memory device and fabrication method thereof
摘要 A nonvolatile read-only memory device, wherein a word line is on a substrate and the word line includes a metal layer a polysilicon line. A trapping layer is further located between the word line and the substrate. A polysilicon protection line is formed over the substrate and the polysilicon protection line connects the word line and a grounded doped region in the substrate, wherein the resistance of the polysilicon protection line is higher than that of the word line.
申请公布号 US2004037147(A1) 申请公布日期 2004.02.26
申请号 US20030643335 申请日期 2003.08.15
申请人 KUO TUNG-CHENG;LIU CHIEN-HUNG;PAN SHYI-SHUH;HUANG SHOU-WEI 发明人 KUO TUNG-CHENG;LIU CHIEN-HUNG;PAN SHYI-SHUH;HUANG SHOU-WEI
分类号 H01L21/336;H01L21/8246;H01L21/8247;H01L27/105;H01L27/115;H01L29/792;(IPC1-7):G11C7/00 主分类号 H01L21/336
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