发明名称 SURFACE UNEVENNESS FORMING METHOD, OPTICAL FILM OBTAINED BY THE SAME, DIFFUSE REFLECTION BOARD AND MANUFACTURING METHOD OF DIFFUSE REFLECTION BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method which can conveniently and inexpensively form the resin surface uneven shape, and to provide a transferring prototype using the same, a transferring prototype which forms the transferring prototype, transfer base film, a diffuse reflection board and optical film. <P>SOLUTION: This surface unevenness forming method includes a process for forming an energy-sensitive negative resin composite layer containing at least one or more kinds of polymarizable monomers or oligomers, a process for irradiating activated energy rays at least once or more via a mask with the pattern formed or a process for directly plotting the pattern and a process for performing afterbaking without performing an etching operation. The energy-sensitive negative resin composite layer preferably includes (a) one or more kinds of the polymarizable monomers or oligomers having at least one or more epoxy radicals or oxetanyl radicals and (b) a potential cationic polymerized catalyst which forms a cationic polymerized catalyst by irradiation of the activated energy rays. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004062051(A) 申请公布日期 2004.02.26
申请号 JP20020223407 申请日期 2002.07.31
申请人 HITACHI CHEM CO LTD 发明人 IWAMURO MITSUNORI;TAI SEIJI;TSURUOKA YASUO;KIZAWA KEIKO;SATO KAZUYA
分类号 G02B5/02;G02B5/08;G02F1/1333;G02F1/1335 主分类号 G02B5/02
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