| 摘要 |
A composition containing a high-molecular compound having as a photo-crosslinkable group any of a cinnamoyl group, a cinnamylidene group, a chalcone residual group, an isocoumarin residual group, a 2,5-dimethoxystilbene residual group, a thymine residual group, a styrylpyridinium residual group, an alpha-phenylmaleimide residual group, an anthracene residual group and a 2-pyrone residual group, or an aromatic bisazide, is cross-linked by light irradiation via a mask to cure the composition in a prescribed pattern to form photoemission layers.
|
