| 摘要 |
PURPOSE: A field emission device and a fabrication method thereof are provided to insulate a spacer as well as a cathode using an insulation film having low residual stress. CONSTITUTION: A field emission device comprises a base plate(1) having a cathode(2), a top plate having an anode, a spacer maintaining spacing between the base plate and the top plate, and an insulation film(3,4,7) made of amorphous silicon and insulating the cathode and the spacer between the base plate and the spacer. The insulation film insulating the cathode and the spacer has a stacked structure of the amorphous silicon and silicon oxidation film, or the amorphous silicon and silicon nitride film. A field emission device fabrication method comprises a step of forming the base plate and the top plate, a step of arranging the spacer between the base plate and the top plate, and a step of sealing the base plate and the top plate. The insulation film between the base plate and the spacer is evaporated with amorphous silicon by sputtering method.
|
