| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which provides a coating with excellent properties in uniformity and corrosion resistance, is superior in film-forming efficiency and reproducibility, and has the long life, and to provide a hard coating and a hard-coated member. SOLUTION: The sputtering target is manufactured by means of degassing a base powder which contains Cr as a main component and at least one metallic element selected among Al, Si, Ti, Zr, Hf, V, Ta, W, Mo and B, and sintering it; and is characterized in that diameters of Cr-segregaed parts 1 in the target are 50μm or less, in which the count number is 600 or more when a Cr element in an area of 200μm square of the structure is mapped with an X-ray micro analyzer at an accelerating voltage of 15 kV. COPYRIGHT: (C)2004,JPO
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