发明名称 SOLID-STATE IMAGING ELEMENT AND METHOD MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a solid-state imaging element which can reduce deterioration of image quality, particularly deterioration of the image quality at the edge portion of substrate and assure high accuracy read images. SOLUTION: A frame type field oxide film 4 is formed to a concave area R to surround the effective imaging region 1A of the solid-state imaging element. Accordingly, this surface is located so as to be at approximately the same level as the surface level of a photosensor 2. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004055669(A) 申请公布日期 2004.02.19
申请号 JP20020208507 申请日期 2002.07.17
申请人 FUJI FILM MICRODEVICES CO LTD;FUJI PHOTO FILM CO LTD 发明人 AIDA TSUTOMU;SAITO MAKI
分类号 H01L21/316;H01L21/76;H01L27/146;H04N5/335;H04N5/369;H04N5/372;(IPC1-7):H01L27/146 主分类号 H01L21/316
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