Beam guiding system, imaging method, and system for electron microscopy

摘要

An object field (OF) (13) for an object plane (3) imaged onto a location-resolving detector can be deflected by an adjustable amount (M) in respect of an optical principal axis (17) in a microscopy system (1). Secondary electrons emerging from the OF are formed into a secondary electron beam (14), threaded through a microscopy lens (11) and transmitted onto the detector. Independent claims are also included for the following: (a) An electron lithography system for using a graphic beam to transmit a pattern onto a radiation-sensitive layer; (b) an electron microscopy system for using a beam of secondary electrons to image an object plane into a intermediate focal plane; (c) a method for using a beam of charged particles to image an object field into an image field fixed in a first intermediate focal plane, the object field being relocatable in a first direction in an object field; (d) a beam-control system for controlling two beams of charged particles; (e) an electron microscopy system for using a beam of secondary electrons to generate an image of an object plane; (f) a method for operating an electron microscopy system with electron optics.