发明名称 Lateral semiconductor device
摘要 A lateral semiconductor device has a semiconductor layer on an insulating layer on a semiconductor substrate. The semiconductor layer has a region of a first conduction type and a region of a second conduction type with a drift region therebetween. The drift region is provided by a region of the first conduction type and a region of the second conduction type. The first and second conduction type drift regions are so arranged that when a reverse voltage bias is applied across the first and second conduction type regions of the semiconductor layer, the second conduction type drift region has an excess of charge relative to the first conduction type drift region which varies substantially linearly from the end of the drift region towards the first conduction type region of the semiconductor layer to the end of the drift region towards the second conduction type region of the semiconductor layer.
申请公布号 US6693340(B1) 申请公布日期 2004.02.17
申请号 US20010870040 申请日期 2001.05.30
申请人 FUJI ELECTRIC CO., LTD.;CAMBRIDGE UNIVERSITY TECHNICAL SERVICES LIMITED 发明人 AMARATUNGA GEHAN ANIL JOSEPH;NG RANICK KIAN MING;UDREA FLORIN
分类号 H01L29/06;H01L29/78;H01L29/786;H01L29/861;(IPC1-7):H01L23/58 主分类号 H01L29/06
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