发明名称 |
Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
摘要 |
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.
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申请公布号 |
US6692888(B1) |
申请公布日期 |
2004.02.17 |
申请号 |
US19990413763 |
申请日期 |
1999.10.07 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
BARCLAY GEORGE G.;MAO ZHIBIAO;KAVANAGH ROBERT J. |
分类号 |
G03F7/004;C07C69/00;C07C69/013;C07C69/54;C08F220/18;C08F220/44;C08K5/00;C08L33/08;C08L33/10;C08L33/20;C08L101/08;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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