发明名称 |
METHOD FOR FABRICATING MASK BLANK OR MASK BY USING WASTE MASK |
摘要 |
PURPOSE: A method for fabricating a mask blank or a mask by using a waste mask is provided to fabricate a low-priced mask and reduce a fabricating cost by recycling the waste mask. CONSTITUTION: A mask is extracted from a raw material mask(401-413). A state of defect is determined by inspecting the mask. A new mask for forming a fine pattern is fabricated if the defect is not found on the substrate. After the new mask is fabricated, an inspecting process for the fabricated mask is performed. A packaging process is performed if an error is not found on the fabricated mask. In the extracting process, a pellicle is removed from the raw material mask(403-407). In addition, a function layer is removed from the raw material mask(409-413).
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申请公布号 |
KR20040014377(A) |
申请公布日期 |
2004.02.14 |
申请号 |
KR20030078791 |
申请日期 |
2003.11.07 |
申请人 |
CHARM ENGINEERING CO., LTD. |
发明人 |
HAN, JUN HO |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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