发明名称 APPARATUS AND METHOD FOR MANAGING PARTICLE ANALYSIS DATA FOR SEMICONDUCTOR FABRICATION EQUIPMENT
摘要 PURPOSE: An apparatus and a method for managing particle analysis data for semiconductor fabrication equipment are provided to manage correctly the particle analysis data within a short period of time by using a processor to array the particle analysis data and form a database. CONSTITUTION: An apparatus for managing particle analysis data for semiconductor fabrication equipment includes an inspection unit(1), a processor(3), a particle character data storage unit(5), and a particle picture data storage unit(7). The inspection unit(1) inspects particles of a wafer and generates a particle data file. The processor(3) is used for extracting and storing particle character data and particle picture data and outputting the request information on the basis of the stored data. The particle character data storage unit(5) stores the particle character data. The particle picture data storage unit(7) stores the particle picture data.
申请公布号 KR20040013824(A) 申请公布日期 2004.02.14
申请号 KR20020046911 申请日期 2002.08.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, SEONG CHEOL;KIM, YONG HYEON;MUN, GI YEONG
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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