发明名称 SUBSTRATE AND METHOD FOR PRODUCING A SUBSTRATE
摘要 The invention relates to a substrate (600) which is provided with a support layer (501). An insulator layer (502) is applied to the support layer (501), comprising at least two areas having respectively different thicknesses. A semi-conductor layer (303) having an FD-area (304) and a PD-area (305) is applied to the surface of the insulating layer (502), comprising a planar surface. The planar surface is the surface which is opposite the insulating layer (502).
申请公布号 WO03088310(A3) 申请公布日期 2004.02.12
申请号 WO2003DE01281 申请日期 2003.04.16
申请人 INFINEON TECHNOLOGIES AG;HOFMANN, FRANZ;LUYKEN, RICHARD, JOHANNES;ROESNER, WOLFGANG;SPECHT, MICHAEL;STAEDELE, MARTIN 发明人 HOFMANN, FRANZ;LUYKEN, RICHARD, JOHANNES;ROESNER, WOLFGANG;SPECHT, MICHAEL;STAEDELE, MARTIN
分类号 H01L29/06;H01L21/02;H01L21/20;H01L21/265;H01L21/336;H01L21/762;H01L21/8234;H01L27/08;H01L27/088;H01L27/12;H01L29/786 主分类号 H01L29/06
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