| 发明名称 |
Pattern-forming material and method of forming pattern |
| 摘要 |
A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator: wherein R1 is a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; and R2 is a protecting group released by an acid.
|
| 申请公布号 |
US2004029035(A1) |
申请公布日期 |
2004.02.12 |
| 申请号 |
US20030415272 |
申请日期 |
2003.04.28 |
| 申请人 |
KISHIMURA SHINJI;ENDO MASAYUKI;SASAGO MASARU;UEDA MITSURU;FUJIGAYA TSUYOHIKO |
发明人 |
KISHIMURA SHINJI;ENDO MASAYUKI;SASAGO MASARU;UEDA MITSURU;FUJIGAYA TSUYOHIKO |
| 分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/00;G03F7/20;G03F7/30;G21K5/00 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
